Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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169 results for Jim Stathis

Critical Assessment of Soft Breakdown Stability Time and the Implementation of New Post-Breakdown Methodology for ultra-thin gate oxides
- - E. Wu
  - J. Suñé
  - et al.
- 2003
- IEDM 2003
Reliability projection for ultra-thin oxides at low voltage
- - J.H. Stathis
  - D.J. DiMaria
- 1998
- IEDM 1998
Superior PBTI reliability for SOI FinFET technologies and its physical understanding
- - Miaomiao Wang
  - Ramachandran Muralidhar
  - et al.
- 2013
- IEEE Electron Device Letters
Evaluation of NBTI in HfO₂ Gate-Dielectric Stacks With Tungsten Gates
- - Sufi Zafar
  - Byoung H. Lee
  - et al.
- 2004
- IEEE Electron Device Letters
Breakdown transients in ultrathin gate oxides: Transition in the degradation rate
- - S. Lombardo
  - J.H. Stathis
  - et al.
- 2003
- Physical Review Letters
Breakdown Transients in Ultrathin Gate Oxides: Transition in the Degradation Rate
- - S. Lombardo
  - J.H. Stathis
  - et al.
- 2003
- Physical Review Letters
A model for gate-oxide breakdown in CMOS inverters
- - R. Rodríguez
  - J.H. Stathis
  - et al.
- 2003
- IEEE Electron Device Letters
Voltage dependence of hard breakdown growth and the reliability implication in thin dielectrics
- - Barry P. Linder
  - Salvatore Lombardo
  - et al.
- 2002
- IEEE Electron Device Letters
The impact of gate-oxide breakdown SRAM stability
- - R. Rodríguez
  - J.H. Stathis
  - et al.
- 2002
- IEEE Electron Device Letters
Hydrogen electrochemistry and stress-induced leakage current in silica
- - Peter E. Blöchl
  - James H. Stathis
- 1999
- Physical Review Letters