Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
- Hans Becker
- Jay Chey
- et al.
- 2003
- SPIE Photomask Technology 2003
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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109 results for Marie Angelopoulos
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Building high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
- D. Fenzel-Alexander
- et al.
- 2000
- Microlithography 2000
Patterning of highly conducting polyaniline films
- T. Graham
- A. Afzali
- et al.
- 2000
- Microlithography 2000
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Effects of underlayer on performance of bilayer resists for 248-nm lithography
- Katherina Babich
- Alessandro Callegari
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998