Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
A combinatorial research methodology was presented for investigating material factors in photoresist formulation more rapidly with respect to traditional experimental design. The major advantage of combinatorial methodology is its ability to generate data over a wide range of system variables simultaneously. It is shown that the combinatorial technique generates both temperature and time gradients in polymer films.
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020