Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

01 Jul 1987

Summary Abstract’ Integrated system for studies of thln-film chemical growth processes on silicon wafers

View publication

Abstract

No abstract available.

Paper

Interface kinetics and crystal growth under conditions of constant cooling rate. I. Constant diffusion coefficient

R. Ghez, J.S. Lew

Journal of Crystal Growth

Paper

Hierarchical hydrodynamic flow confinement: Efficient use and retrieval of chemicals for microscale chemistry on surfaces

Julien Autebert, Aditya Kashyap, et al.

Langmuir

Conference paper

Modeling polarization for Hyper-NA lithography tools and masks

Kafai Lai, Alan E. Rosenbluth, et al.

SPIE Advanced Lithography 2007

Paper

Theory of temperature-induced Mott transitions

Ellen J. Yoffa, David Adler

Physical Review B

View all publications