Naga Ayachitula, Melissa Buco, et al.
SCC 2007
A new method is described for the real-time in-line control of critical dimensions forpositive-tone chemically amplified resist systems. The technique relies on the generation of adiffraction grating in the resist film when a latent image appears during the post-exposure bake. Asimple optical illumination/collection arrangement allows the diffracted signal to be measuredduring the post-exposure bake. This signal can be correlated to linewidths when measured by anon-destructive SEM. The result is a post-exposure bake time that can be used to correct forexposure-and-bake temperature variations to conveniently provide overall process control.Results generated by a prototype system are presented for a variety of 0.5-.tm mask levels andprocess conditions.
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985