PaperNon-thermal effects in laser-enchanced etching of silicon by XeF2F.A. HouleChemical Physics Letters
Conference paperExperimental method for quantifying acid diffusion in chemically amplified resistsG.M. Wallraff, W.D. Hinsberg, et al.SPIE Advances in Resist Technology and Processing 1999
PaperStochastic simulations of temperature programmed desorption kineticsF.A. Houle, W.D. HinsbergSurface Science
PaperContinuous wave visible laser assisted decomposition of Cr(CO)6 on a growing film: In situ observationsF.A. Houle, L.I. YehJournal of Physical Chemistry