Conference paperRecent advances in search for suitable high-k/metal gate solutions to replace SiON/Poly-silicon gate stacks in CMOS devices for 45nm and beyond technologiesB.P. Linder, V.K. Paruchuri, et al.ECS Meeting 2007
Conference paperChallenges in FEOL logic device integration for 32 nm technology node and beyondDae-Gyu Park, M. Chudzik, et al.ECS Meeting 2007
Conference paperMixed orientation Si-Si interfaces by hydrophilic bonding and high temperature oxide dissolution: Wafer fabrication technique and device applicationsK.L. Saenger, J.P. De Souza, et al.ECS Meeting 2007
Conference paperChallenge for high-k/metal gate CMOSFETs in 32 nm generation and beyondM. TakayanagiECS Meeting 2007