Challenge for high-k/metal gate CMOSFETs in 32 nm generation and beyond

Abstract

High-k/metal gate stack is highly expected in 32 nm generation CMOSFETs. However, adjustment of threshold voltage, Vth, is still the major challenge for high-k/metal gate CMOSFETs at this point. This paper reviews the current situation and suggested solutions of Hf-related gate dielectrics/metal gate stacks mainly focused on work function control. ©The Electrochemical Society.