Publications

14 results at Microlithography 1994

Fabrication of phase shifting masks employing multi-layer films
- - T.C. Chicu
  - K.K. Shih
  - et al.
- 1994
- Microlithography 1994
Quantitative stepper metrology using the focus monitor test mask
- - T.A. Brunner
  - A.L. Martin
  - et al.
- 1994
- Microlithography 1994
Scattered light in photolithographic lenses
- - Joseph P. Kirk
- 1994
- Microlithography 1994
Experimental verification of high numerical aperture effects in photoresist
- - Donis G. Flagello
  - Tom Milster
- 1994
- Microlithography 1994
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- - Lars W. Liebmann
  - Thomas H. Newman
  - et al.
- 1994
- Microlithography 1994
Impact of attenuated mask topography on lithographic performance
- - Richard A. Ferguson
  - William J. Adair
  - et al.
- 1994
- Microlithography 1994
A new mask evaluation tool, the microlithography simulation microscope aerial image measurement system
- - R.A. Budd
  - D.B. Dove
  - et al.
- 1994
- Microlithography 1994
Application of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- - R. Martino
  - R. Ferguson
  - et al.
- 1994
- Microlithography 1994
0.25-μm lithography development using positive mode top surface imaging photoresist
- - Douglas C. La Tulipe
  - John P. Simons
  - et al.
- 1994
- Microlithography 1994
Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
- - Veena Rao
  - William D. Hinsberg
  - et al.
- 1994
- Microlithography 1994