A deformation induced order‐disorder transition in isotactic polypropylene
- Ravi F. Saraf
- Roger S. Porter
- 2004
- Polymer Engineering & Science
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Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
Epoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
Curing of polyimides
- Claudius Feger
- 2004
- Polymer Engineering & Science
Photochemical free‐volume generation in poly(methyl methacrylate) photoresists
- William Limm
- Mitchell A. Winnik
- et al.
- 2004
- Polymer Engineering & Science
Morphological and mechanical property studies of polymer extrudates obtained by the rotational extrusion process
- Bin Chung
- Anagnostis E. Zachariades
- 2004
- Polymer Engineering & Science
Concerning voids in polyimide
- T.P. Russell
- 2004
- Polymer Engineering & Science
Stress development in supported polymer films during thermal cycling
- Ho-Ming Tong
- C.-K. Hu
- et al.
- 2004
- Polymer Engineering & Science