integrated thermal chemical vapor deposition processing for Si technology
- M. Liehr
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Growth of CoSi2on Si(001): Structure, defects, and resistivity
- R.D. Thompson
- S.S. Iyer
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Density dependence of the electrochemical characteristics of carbon overcoated thin film media
- Grace L. Gorman
- John Duran
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Defect microchemistry in Si02/Si structures
- G.W. Rubloff
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The importance of free radical recombination reactions in CF4 /02 plasma etching of silicon
- K.F. Jensen
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface diffractometry and lattice imaging of scanning tunneling microscopy images
- J.E. Demuth
- R.J. Hamers
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular beam studies of trapping dynamics
- W.H. Weinberg
- C.B. Mullins
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation controlled phase selection in vanadium/amorphous silicon multilayer thin films
- R.R. de Avillez
- E. Ma
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis of realistic semiconductor microstructures
- Gottlieb S. Oehrlein
- Kevin K. Chan
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Competitive reactions of fluorine and oxygen with W, WSi2, and Si surfaces in reactive ion etching using CF4/O2
- Gottlieb S. Oehrlein
- J. Lennart Lindsöm
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films