Publications

221 results at Microelectronic Engineering

A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- - E. Babich
  - J. Paraszczak
  - et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- - J. Silverman
  - V. Dimilia
  - et al.
- 1989
- Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- - P. Coane
  - P. Rudeck
  - et al.
- 1989
- Microelectronic Engineering
Chemically assisted ion beam etching process for high quality laser mirrors
- - P. Buchmann
  - H.P. Dietrich
  - et al.
- 1989
- Microelectronic Engineering
A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- - Donis Flagello
  - Andrew Pomerene
- 1989
- Microelectronic Engineering
X-ray transmission through low atomic number particles
- - R.A. DellaGuardia
  - David Seeger
  - et al.
- 1989
- Microelectronic Engineering
A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- - E. Babich
  - J.M. Shaw
  - et al.
- 1987
- Microelectronic Engineering
Photoemission sampling technique for high-speed integrated-circuit testing
- - H. Beha
  - H.K. Seitz
  - et al.
- 1987
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- - J. Paraszczak
  - E. Babich
  - et al.
- 1987
- Microelectronic Engineering
Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- - Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering