Recent advances in the photodecomposition mechanisms of diazo‐oxides
- J. Pacansky
- 2004
- Polymer Engineering & Science
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45 results at Polymer Engineering & Science
Dissolution dynamics of some polymers: Solvent‐polymer boundaries
- A.C. Ouano
- J.A. Carothers
- 2004
- Polymer Engineering & Science
Physical properties of polymers–an introductory discussion
- Thor L. Smith
- 2004
- Polymer Engineering & Science
Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- J. Liutkus
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Azide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
Absorption of NH3 by nylon‐6
- Anagnostis E. Zachariades
- Tetsuo Kanamoto
- et al.
- 2004
- Polymer Engineering & Science
Super strong polymers in planar directions
- Anagnostis E. Zachariades
- James Economy
- 2004
- Polymer Engineering & Science
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science