Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Kigook Song, Robert D. Miller, et al.
Macromolecules
T.N. Morgan
Semiconductor Science and Technology
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules