G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
R.W. Gammon, E. Courtens, et al.
Physical Review B
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989