22 nm technology compatible fully functional 0.1 μm 2 6T-sram cell
- B. Haran
- A. Kumar
- et al.
- 2008
- IEDM 2008
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91 results for Karen Petrillo
HIGHLY LATCHUP-IMMUNE 1- mu m CMOS TECHNOLOGY FABRICATED WITH 1 Mev ION IMPLANTATION AND SELF-ALIGNED TiSi//2.
- F.S. Lai
- L.K. Wang
- et al.
- 1984
- IEDM 1984
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
- P. Labeaume
- K. Hernandez
- et al.
- 2024
- SPIE Advanced Lithography 2024
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Novel spin-on overcoat materials for EUV photoresist enhancement
- Xisen Hou
- Yinjie Cen
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
- Jayoung Koo
- YunJi Kim
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2021
- ASMC 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021