Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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221 results at Microelectronic Engineering

Understanding high numerical aperture optical lithography
- - D. Flagello
  - Alan E. Rosenbluth
  - et al.
- 1992
- Microelectronic Engineering
Positive mode silylation process characterization
- - D.C. La Tulipe
  - A.T.S. Pomerene
  - et al.
- 1992
- Microelectronic Engineering
Shallow junctions, silicide requirements and process technologies for sub 0.5 μm CMOS. Invited review paper
- - Bijan Davari
- 1992
- Microelectronic Engineering
Overlay measurement using the low voltage scanning electron microscope
- - Michael G. Rosenfield
  - A. Starikov
- 1992
- Microelectronic Engineering
SiCGe ternary alloys - extending Si-based heterostructures
- - Subramanian S. Iyer
  - K. Eberl
  - et al.
- 1992
- Microelectronic Engineering
Definition and measurement rule for voltage resolution of contactless testing systems based on electron-beam or photoemission methods
- - R. Clauberg
  - R. Lackmann
- 1992
- Microelectronic Engineering
Annealing behavior of gold absorber in x-ray masks
- - R.E. Acosta
  - W.A. Johnson
  - et al.
- 1992
- Microelectronic Engineering
Light scattering properties of x-ray lithography mask substrates
- - J.R. Maldonado
  - Y. Vladimirsky
  - et al.
- 1991
- Microelectronic Engineering
Comparison of vapor and liquid phase silylation processes of photoresists
- - E. Babich
  - J. Paraszczak
  - et al.
- 1991
- Microelectronic Engineering
Device design issues for a high-performance technology with Si or SiGe epitaxial base
- - J.N. Burghartz
  - J.D. Cressler
  - et al.
- 1991
- Microelectronic Engineering