Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture FilmsS. ZirinskyE.A. Irene2019JES
Preparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 FilmsD.W. DongE.A. Ireneet al.2019JES
Silicon Oxidation Studies: Morphological Aspects of the Oxidation of Polycrystalline SiliconE.A. IreneE. Tierneyet al.2019JES
Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure OxygenE.A. IreneD.W. Donget al.2019JES
Silicon Oxidation Studies: The Oxidation of Heavily B- and P-Doped Single Crystal SiliconE.A. IreneD.W. Dong2019JES
An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline siliconE.A. IreneE. Tierneyet al.2019JES