Exploring thin-film reactions by means of simultaneous x-ray surface roughness and resistance measurements
- C. Lavoie
- C. Cabral Jr.
- et al.
- 2001
- Defect and Diffusion Forum
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.