Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET TechnologyDexin KongDaniel Schmidtet al.2020ASMC 2020
AFM characterization for Gate-All-Around (GAA) devicesMary BretonJennifer Fullamet al.2020SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resistsDaniel SchmidtKaren Petrilloet al.2020SPIE Advanced Lithography 2020