High-performance CMOS-compatible self-aligned In0.53Ga0.47As MOSFETs with GMSAT over 2200 μs/μm at VDD = 0.5 vYanning SunAmlan Majumdaret al.2014IEDM 2014
High performance 32nm SOI CMOS with high-k/metal gate and 0.149μm 2 SRAM and ultra low-k back end with eleven levels of copperB. GreeneQ. Lianget al.2009VLSI Technology 2009
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gateK. HensonH. Buet al.2008IEDM 2008
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first processX. ChenS. Samavedamet al.2008VLSI Technology 2008
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processingM. ChudzikB. Doriset al.2007VLSI Technology 2007
Synthesis and control of ultra thin gate oxides for the 90 and 65 NM nodesJoseph F. Shepard Jr.Anthony Chouet al.2005RTP 2005
Dual stress liner enhancement in hybrid orientation technologyC. SherawM. Yanget al.2005VLSI Technology 2005
High performance CMOS bulk technology using direct silicon bond (DSB) mixed crystal orientation substratesChun-Yung SungHaizhou Yinet al.2005IEDM 2005