EUV sub-resolution assist feature impact: experimental and simulation evaluation
- Zheng Chen
- Martin Burkhardt
- et al.
- 2023
- OEN 2023
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56 results for Luciana Meli
Focus considerations of design pitches and absorber choice for EUV random logic
- Martin Burkhardt
- Zheng Chen
- et al.
- 2022
- OEN 2022
Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- Jennifer Church
- Graham Jensen
- et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
A holistic characterization methodology for stochastic printing failures in EUV contact holes
- Jennifer Church
- Brad Austin
- et al.
- 2021
- ASMC 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- A. Dutta
- Jennifer Church
- et al.
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- Chris Robinson
- Cody Murray
- et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- Karen Petrillo
- Dave Hetzer
- et al.
- 2019
- ANTS 2019