Decomposition of the TCC using non-coherent kernels for faster calculation of lithographic images
- Alan E. Rosenbluth
- 2017
- SPIE Advanced Lithography 2017
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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49 results for Alan E. Rosenbluth
Lithography process model building using locally linear embedding
- Pardeep Kumar
- Alan E. Rosenbluth
- et al.
- 2015
- SISPAD 2015
Impact of sub-wavelength electromagnetic diffraction in optical lithography for semiconductor chip manufacturing
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- 2013
- IMOC 2013
Radiometric consistency in source specifications for photolithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2011
- COSI 2011
Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Isotropic treatment of EMF effects in advanced photomasks
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009