Publications

45 results for M. Chudzik

Challenges in FEOL logic device integration for 32 nm technology node and beyond
- - Dae-Gyu Park
  - M. Chudzik
  - et al.
- 2007
- ECS Meeting 2007
A comparative study of NBTI and PBTI (Charge Trapping) in SiO ₂/HfO₂ stacks with FUSI, TiN, Re gates
- - S. Zafar
  - Y.-H. Kim
  - et al.
- 2006
- VLSI Technology 2006
Band-edge high-performance high-κ /metal gate n-MOSFETs using cap layers containing group IIA and IIIB elements with gate-first processing for 45 nm and beyond
- - V. Narayanan
  - V.K. Paruchuri
  - et al.
- 2006
- VLSI Technology 2006
Charge defects, Vt shifts, and the solution to the high-k metal gate n-MOSFET problem
- - Supratik Guha
  - Vijay Narayanan
  - et al.
- 2006
- Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2006
A comparison of electrical and physical properties of MOCVD hafnium silicate thin films deposited using various silicon precursors
- - P. Jamison
  - M. Copel
  - et al.
- 2006
- MRS Spring Meeting 2006
Synthesis and control of ultra thin gate oxides for the 90 and 65 NM nodes
- - Joseph F. Shepard Jr.
  - Anthony Chou
  - et al.
- 2005
- RTP 2005
Charge trapping in aggressively scaled metal gate/high-κ stacks
- - E. Gusev
  - V. Narayanan
  - et al.
- 2004
- IEDM 2004
Thermally robust dual-work function ALD-MN _x MOSFETs using conventional CMOS process flow
- - D.-G. Park
  - Z. Luo
  - et al.
- 2004
- VLSI Technology 2004
Systematic study of pFET V_t with Hf-based gate stacks with poly-Si and FUSI gates
- - E. Cartier
  - V. Narayanan
  - et al.
- 2004
- VLSI Technology 2004
Surface potential and morphology issues of annealed (HfO ₂) _x(SiO ₂) _1-x gate oxides
- - R. Ludeke
  - P. Lysaght
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures