Conference paper
Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
An overview of our recent work on ultrathin (<100 Å) films of metal oxides deposited on silicon for advanced gate dielectrics applications will be presented. Data on ultrathin Al2O3, ZrO2, HfO2, and Y2O3 will be shown to illustrate the complex processing, integration and device-related issues for high dielectric constant ('high-K') materials. Both physical and electrical properties, as well as the effects of pre- and post-deposition treatments will be discussed. © 2001 Elsevier Science B.V. All rights reserved.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Kigook Song, Robert D. Miller, et al.
Macromolecules
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
David B. Mitzi
Journal of Materials Chemistry