Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The use of scaling concepts in understanding growth by molecular beam epitaxy (MBE) is increasingly important these days. Here we present a critical discussion on the advantages and disadvantages of kinetic theories and continuum models, two main methods frequently used to study the roughening and scaling of surfaces grown by MBE. Finally, some open problems faced by these approaches are also discussed.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997