G.M. Wallraff, W.D. Hinsberg, et al.
SPIE Advances in Resist Technology and Processing 1999
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
G.M. Wallraff, W.D. Hinsberg, et al.
SPIE Advances in Resist Technology and Processing 1999
G.M. Wallraff, Carl E. Larson, et al.
J. Photopolym. Sci. Tech.
R.D. Allen, R. Soortyakumaran, et al.
J. Photopolym. Sci. Tech.
M.I. Sanchez, L.K. Sundberg, et al.
SPIE Advanced Lithography 2013