Soft x-ray diffraction of striated muscle
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
We used the tertiary-butyl ester protecting group for the construction of our 193-nm resists.[l] This paper describes an investigation of the impact of acid-cleavable protecting group structure on the properties of a series of model acrylic polymers. In this investigation, factors such as thermochemical stability, reactivity to photogenerated acid, and dissolution properties of exposed films as a function of dose were examined. The impact of photo-add structure and its role in the dissolution properties of exposed films will also be discussed. Additionally, we will introduce a new cycloaliphatic polymer family (polynorbomenes) with superior etch resistance, significantly broadening the polymer chemistry available for the construction of new 193-nm photoresists. [2] ©1996 TAPJ.
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
T.N. Morgan
Semiconductor Science and Technology
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters