Conference paperRelationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium saltsG.M. Wallraff, D.R. McKean, et al.ACS PMSE 1989
PaperLithographic techniques for the fabrication of oligonucleotide arraysG.M. Wallraff, W.D. Hinsberg, et al.J. Photopolym. Sci. Tech.
PaperCharacterization and acid diffusion measurements of new strong acid photoacid generatorsG.M. Wallraff, Carl E. Larson, et al.Proceedings of SPIE-The International Society for Optical Engineering
PaperFluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluationHiroshi Ito, H.D. Truong, et al.J. Photopolym. Sci. Tech.