Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The adoption of ultra-low k dielectric materials in the pursuit of greater performance will pose reliability challenges quite unlike what we have previously experienced. The ultra-low k (ULK) dielectrics are completely different from the materials we have traditionally used. Unfortunately, the properties that make them desirable from an electrical point of view make them undesirable from a mechanical and environmental point of view. Low mechanical strength, low elastic modulus, rapid diffusion and susceptibility to dielectric breakdown are all characteristic of the ULK dielectrics. In this paper we review work we have performed in our laboratory to understand and characterize these new and temperamental materials. © 2004 Published by Elsevier Ltd.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
Imran Nasim, Melanie Weber
SCML 2024
Ronald Troutman
Synthetic Metals