Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications

Abstract

Molecular glass resists have gained attention for the past decade as a potential platform for high resolution lithography. Several molecular resist materials based on the calix[4]resorcinarene system have been developed. Though this molecular system is very versatile, there are several challenges with the synthesis and processing of these materials. The difficulty to synthesize a monodipserse unit, the poor solubility in casting solvents and incompatibility with conventional developer are some noted challenges. We have addressed these issues by designing a new calix[4]resorcinarene resist material with hexafluro alcohol (HFA) units. The resist platform has been evaluated with e-beam and EUV lithography. © 2011 SPIE.