Buckling characterization of gate all around silicon nanowires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2013
- SPIE Advanced Lithography 2013
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14 results at SPIE Advanced Lithography 2013
CD optimization methodology for extending optical lithography
- C. Wong
- G. Seevaratnam
- et al.
- 2013
- SPIE Advanced Lithography 2013
Etch correction and OPC, a look at the current state and future of etch correction
- Ian Stobert
- Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Advanced plasma etch for the 10nm node and beyond
- 2013
- SPIE Advanced Lithography 2013
Computational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Enabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- Bassem Hamieh
- Hyun Chol Choi
- et al.
- 2013
- SPIE Advanced Lithography 2013
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Deterministically isolated gratings through the directed self-assembly of block copolymers
- Gregory Sadasdf Doerk
- Joy Y. Cheng
- et al.
- 2013
- SPIE Advanced Lithography 2013
Development of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013