Publications

16 results at ACS Spring 1991

Sensitive polysilane resists for bilayer lithography
- - G.M. Wallraff
  - R.D. Miller
  - et al.
- 1991
- ACS Spring 1991
Strategies for crosslinking NLO-polymers across the chromophore
- - K. Betterton
  - M. Ebert
  - et al.
- 1991
- ACS Spring 1991
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- - R.D. Allen
  - G.M. Wallraff
  - et al.
- 1991
- ACS Spring 1991
Base-catalyzed photosensitive polyimide
- - D.R. McKean
  - G.M. Wallraff
  - et al.
- 1991
- ACS Spring 1991
Chemically amplified photoresist for visible laser direct imaging
- - G.M. Wallraff
  - R.D. Allen
  - et al.
- 1991
- ACS Spring 1991
Base-catalyzed cyclization of ortho-aromatic amide-alkyl esters: a novel approach to chemical imidization
- - W. Volksen
  - T. Pascal
  - et al.
- 1991
- ACS Spring 1991
Overview of top-surface-imaging resists
- - Scott A. MacDonald
- 1991
- ACS Spring 1991
Synthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures
- - G.M. Wallraff
  - J.L. Hedrick
  - et al.
- 1991
- ACS Spring 1991
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- - W.D. Hinsberg
  - Scott A. MacDonald
  - et al.
- 1991
- ACS Spring 1991
Acid-catalyzed dehydration for the design of chemical amplification resists
- - Hiroshi Ito
  - R. Sooriyakumaran
  - et al.
- 1991
- ACS Spring 1991