Publications

11 results at Microlithography 2005

Toward through-process layout quality metrics
- - Fook-Luen Heng
  - Jin-Fuw Lee
  - et al.
- 2005
- Microlithography 2005
Integrating DfM components into a cohesive design-to-silicon solution
- - Lars Liebmann
  - Dan Maynard
  - et al.
- 2005
- Microlithography 2005
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- Microlithography 2005
Interfacial structure of photoresist thin films in developer solutions
- - Vivek M. Prabhu
  - Bryan D. Vogt
  - et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- - S.E. Steen
  - S.J. McNab
  - et al.
- 2005
- Microlithography 2005
Perfluoropolyethers as novel materials for soft lithography
- - Jason P. Rolland
  - Eric C. Hagberg
  - et al.
- 2005
- Microlithography 2005
Studies of acid diffusion in low Ea chemically amplified photoresists
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2005
- Microlithography 2005