Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride Films
- R.C. Taylor
- B.A. Scott
- 2019
- JES
Publications
509 results at JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES
Heating Effects In Reactive Etching Of Nb And Nb205
- Young H. Lee
- 2019
- JES
Thermally Developable, Positive Resist Systems with High Sensitivity
- Hiroshi Ito
- Reinhold Schwalm
- 2019
- JES
Reactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases
- Yue Kuo
- 2019
- JES
Selective dry etching of germanium with respect to silicon and vice versa
- G.S. Oehrlein
- T.D. Bestwick
- et al.
- 2019
- JES
Repassivation transients measured with thin film breaking electrodes
- G.S. Frankel
- B. Rush
- et al.
- 2019
- JES
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
A Diffusion Model for Electron-Hole Recombination in Zn2SiO4:(Mn, As) Phosphors
- D.J. Robbins
- N. Caswell
- et al.
- 2019
- JES
Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage
- B.S. Lee
- H. Baratte
- 2019
- JES