Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Nucleation controlled phase selection in vanadium/amorphous silicon multilayer thin films
- - R.R. de Avillez
  - E. Ma
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The importance of free radical recombination reactions in CF₄ /0₂ plasma etching of silicon
- - K.F. Jensen
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Scanning tunneling microscopy and spectroscopy of thin metal films on the GaAs(110) surface
- - P. Martensson
  - R.M. Feenstra
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
(100) and (111) Ni films epitaxially grown on Cu by the metal-metal epitaxy on silicon technique near room temperatures
- - Chin-An Chang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adsorption of boron on Si(111): Physics, chemistry, and atomic-scale electronic devices
- - Ph. Avouris
  - In-Whan Lyo
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Properties of W-N and Mo-N films prepared by reactive sputtering
- - K.K. Shih
  - D.B. Dove
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
In situ plasma contamination measurements by HeNe laser light scattering: A case study
- - J.S. Mckillop
  - Kurt L. Haller
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dynamics of the interaction of ethane with lr(110)-(1 x2)
- - W.H. Weinberg
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray reflectivity study of Si0₂on Si
- - A.A. Bright
  - G.W. Rubioff
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Si₂Cl₆and Si₂H₆adsorption on CaF₂/Si(111)
- - L.J. Terminello
  - F.J. Himpsel
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films