High-Q magnetic inductors for high efficiency on-chip power conversionNaigang WangBruce Doriset al.2016IEDM 2016
Hot carrier effect in ultra-scaled replacement metal gate Sii-xGex channel p-FinFETsMiaomiao WangX. Miaoet al.2016IEDM 2016
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channelsRuilong XiePietro Montaniniet al.2016IEDM 2016
ALD-based confined PCM with a metallic liner toward unlimited enduranceWanki KimMatthew BrightSkyet al.2016IEDM 2016