Comparison of electromigration in Cu interconnects with ALD or PVD TaN liners
- C.-K. Hu
- L. Gignac
- et al.
- 2006
- ECS Meeting 2006
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15 results at ECS Meeting 2006
High mobility channels for ultimate CMOS
- D.K. Sadana
- S.J. Koester
- et al.
- 2006
- ECS Meeting 2006
Advanced applications of semiconductor epitaxy for cutting edge integrated circuit technology
- D.K. Sadana
- M. Yang
- et al.
- 2006
- ECS Meeting 2006
Gold electrodeposition on silicon
- Q. Huang
- H. Deligianni
- et al.
- 2006
- ECS Meeting 2006
Chemical-mechanical polishing of SiCOH-based low-k dielectrics
- Wei-Tsu Tseng
- Akihisa Sakamoto
- et al.
- 2006
- ECS Meeting 2006