Single-expose patterning development for EUV lithography
- Anuja De Silva
- Karen Petrillo
- et al.
- 2017
- SPIE Advanced Lithography 2017
Publications
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91 results for Karen Petrillo
EUV patterning successes and frontiers
- Nelson Felix
- Daniel Corliss
- et al.
- 2016
- SPIE Advanced Lithography 2016
Towards production ready processing with a state-of-the-art EUV cluster
- Karen Petrillo
- Nicole Saulnier
- et al.
- 2015
- SPIE Advanced Lithography 2015
Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- ASMC 2011
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011