Publications

15 results for Mike Hibbs

Two-dimensional mask effects at the 14 nm logic node
- - A.E. Zweber
  - A.E. McGuire
  - et al.
- 2013
- SPIE Photomask Technology 2013
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- - Karen D. Badger
  - Michael Hibbs
  - et al.
- 2013
- SPIE Photomask Technology 2013
Understanding the trade-offs of thinner binary mask absorbers
- - Jaione Tirapu-Azpiroz
  - Gregory McIntyre
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- - Greg McIntyre
  - Michael Hibbs
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- - Alan E. Rosenbluth
  - David O. Melville
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Evaluation of 32nm Advanced immersion lithography pellicles
- - N. Zhou
  - K. Racette
  - et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- - Jaione Tirapu Azpiroz
  - Geoffrey W. Burr
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Phase calibration for attenuating phase-shift masks
- - Michael S. Hibbs
  - Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006