Publications

10 results for Emily Gallagher

Learning from native defects on EUV mask blanks
- - Emily Gallagher
  - Alfred Wagner
  - et al.
- 2014
- SPIE Optics + Photonics 2014
Using pattern shift to avoid blank defects during EUVL mask fabrication
- - Yoshiyuki Negishi
  - Yuki Fujita
  - et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012
The trade-offs between thin and thick absorbers for EUV photomasks
- - Gregory McIntyre
  - Christian Zuniga
  - et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
EUV OPC for 56 nm metal pitch
- - Martin Burkhardt
  - Matt Colburn
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Understanding the trade-offs of thinner binary mask absorbers
- - Jaione Tirapu-Azpiroz
  - Gregory McIntyre
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
SMO photomask inspection in the lithographic plane
- - Emily Gallagher
  - Karen Badger
  - et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- - Alan E. Rosenbluth
  - David O. Melville
  - et al.
- 2009
- SPIE Advanced Lithography 2009