Publications

8 results for Angelique Raley

Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- - Katie Lutker-Lee
  - Jennifer Church
  - et al.
- 2022
- Journal of Vacuum Science and Technology B
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization
- - Xinghua Sun
  - Yann Mignot
  - et al.
- 2022
- Journal of Vacuum Science and Technology B
Contact local CD uniformity optimization through etch shrink
- - Eric Miller
  - Junling Sun
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning
- - Angelique Raley
  - Joe Lee
  - et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning
- - Angelique Raley
  - Joe Lee
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- SPIE Advanced Lithography 2017