Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
- Hiroyuki Miyazoe
- Ashish Jagtiani
- et al.
- 2017
- Journal of Physics D: Applied Physics
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79 results for Eric Joseph
Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
- Ashish Jagtiani
- Hiroyuki Miyazoe
- et al.
- 2016
- JVSTA
Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA
Challenges of tailoring surface chemistry and plasma/surface interactions to advance atomic layer etching
- Sebastian U. Engelmann
- Robert L. Bruce
- et al.
- 2015
- ECS J. Solid State Sci. Technol.
CMOS-Compatible self-aligned In0.53Ga0.47As MOSFETs with gate lengths down to 30 nm
- Amlan Majumdar
- Yanning Sun
- et al.
- 2014
- IEEE T-ED
MIEC (mixed-ionic-electronic-conduction)-based access devices for non-volatile crossbar memory arrays
- Rohit S. Shenoy
- Geoffrey W. Burr
- et al.
- 2014
- Semiconductor Science and Technology
Fabrication of sub-20 nm nanopore arrays in membranes with embedded metal electrodes at wafer scales
- Jingwei Bai
- Deqiang Wang
- et al.
- 2014
- Nanoscale
Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
- Dominik Metzler
- Robert L. Bruce
- et al.
- 2013
- JVSTA