AFM characterization for Gate-All-Around (GAA) devicesMary BretonJennifer Fullamet al.2020SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resistsDaniel SchmidtKaren Petrilloet al.2020SPIE Advanced Lithography 2020
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wiresShimon LeviIshai Schwarzbandet al.2014SPIE Advanced Lithography 2014