Publications

2 results for Saumya Sharma

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019