Self-assembling materials for lithographic patterning: Overview, status and moving forward
- William Hinsberg
- Joy Cheng
- et al.
- 2010
- SPIE Advanced Lithography 2010
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69 results for Dan Sanders
Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Graded spin-on organic bottom antireflective coating for high NA lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Integration of polymer self-assembly for lithographic application
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Orientation control of block copolymer thin films
- Evelyn Auyeung
- Joy Y. Cheng
- et al.
- 2008
- ACS National Meeting 2008
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Contact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Integrating Chemical Language and Physicochemical Features for Enhanced Molecular Property Prediction with Multimodal Language Models
- 2023
- KDD 2023
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces
- Ji Yeon Kim
- Philip Liu
- et al.
- 2020
- ACS AMI