Evaluation of molybdenum silicide for use as a 193 nm phase-shifting absorber in photomask manufacturing
- M. Hibbs
- M. Ushida
- et al.
- 2001
- Proceedings of SPIE- The International Society for Optical Engineering
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.