Sidewall damage in plasma etching of Si/SiGe heterostructures
- R. Ding
- L.J. Klein
- et al.
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.