Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Publications
13 results for J.P. Simons
0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
Positive mode silylation process characterization
- D.C. La Tulipe
- A.T.S. Pomerene
- et al.
- 1992
- Microelectronic Engineering