Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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14 results for A. Charai

Dopant diffusion in silicides: Effect of diffusion paths
- - Carol Stanis
  - J.M. Cotte
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Stability of interfaces in gold-silicon system regarding equilibrium segregation
- - Andrée Rolland
  - Christophe Poisson
  - et al.
- 1997
- Microscopy Microanalysis Microstructures
Reacted amorphous layers: Tantalum and niobium oxides
- - O. Thomas
  - F.M. D’Heurle
  - et al.
- 2006
- Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Interfacial reactions between Al and RuO₂, MoO_x and WN_x diffusion barriers on Si
- - S.-E. Hörnström
  - A. Charai
  - et al.
- 2004
- Surface and Interface Analysis
Formation of Cu₃Si and its catalytic effect on silicon oxidation at room temperature
- - L. Stolt
  - A. Charai
  - et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Polytype formation in zirconium-silicon thin films
- - A. Bourret
  - F.M. D'Heurle
  - et al.
- 1990
- Journal of Applied Physics
Room-temperature oxidation of silicon catalyzed by Cu₃Si
- - J.M.E. Harper
  - A. Charai
  - et al.
- 1990
- Applied Physics Letters
Novel self-aligned W/TiN/TiSi₂ contact structure for very shallow junctions and interconnections
- - R.V. Joshi
  - D. Moy
  - et al.
- 1989
- Applied Physics Letters
Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- - O. Thomas
  - A. Charai
  - et al.
- 1989
- Thin Solid Films
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- - J.M.E. Harper
  - S.E. Harnstram
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films