Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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127 results for Hiroshi Ito
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Developing chemical amplification resists for semiconductor device fabrication by microlithography
- Hiroshi Ito
- 2005
- SPSJ Annual Meeting 2005
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Reactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures